Electron beam drawing device
We offer a lineup of electron beam lithography systems, ranging from high-precision types with an acceleration voltage of 100 kV to universal types with SEM functionality, capable of meeting various needs.
The EBPG series from Raith is a high-speed, high-precision electron beam lithography system designed for small-scale production, with over 130 units delivered worldwide. Features of EBPG: ● Maximum current of 350 nA, achieving the fastest throughput in the industry ● High-precision drawing possible with overlay below 5 nm and stitching below 8 nm ● Automatic aperture change during drawing according to pattern size, reducing drawing time ● Maximum substrate size of 8 inches ● Auto airlock for mass production (up to 10 holders) Lineup of electron beam lithography systems for research and development: ● Pioneer Two (EBL-SEM hybrid) supports up to 50mm x 50mm ● eLINE Plus supports up to 4 inches ● Raith150 Two supports up to 8 inches ● Voyager (with mini engine) supports up to 8 inches
- Company：伯東 本社
- Price：Other
